Linear hollow cathode

AGC Plasma Technology Solutions has successfully scaled up a linear hollow cathode for plasma enhanced chemical vapor deposition (PECVD).

This allows the industrialization of this technology for large area coating on a wide variety of substrates. The integration of the hollow cathode in a standard magnetron sputtering line allows high rate deposition of SiO2 layers among other materials like TiO2, ZnO, SnO, etc. 


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