Linear hollow cathode
AGC Plasma Technology Solutions has successfully scaled up a linear hollow cathode for plasma enhanced chemical vapor deposition (PECVD).
This allows the industrialization of this technology for large area coating on a wide variety of substrates. The integration of the hollow cathode in a standard magnetron sputtering line allows high rate deposition of SiO2 layers among other materials like TiO2, ZnO, SnO, etc.
