AGC Plasma Secures US Patent for Innovative Halogen-Free Water-Repellent Coating Technology
We are proud to announce the approval of a new US patent for our cutting-edge method of creating durable, halogen-free water-repellent coatings for fabric substrates. This technology ensures good water repellency, even after multiple washing cycles, while eliminating the use of fluorine-containing chemicals, making it a sustainable and environmentally friendly solution.
The patented process utilizes a low-pressure hollow cathode plasma polymerization technique with an organosilane monomer, enabling rapid and efficient coating application directly onto fabric substrates. Importantly, this method avoids excessive heating, eliminating the need for substrate cooling and ensuring a streamlined production process.
This innovation represents a significant step forward in sustainable fabric treatment, reinforcing AGC Plasma's commitment to delivering advanced, eco-friendly solutions.
The patent is available for download in the Downloads section of our website.
